Xitronix' Polarization Modulation Photo-Reflectance ("PMPR") systems are designed to provide precision control for dopant activation and strained silicon processes for advanced 45 nm process technologies and beyond. Xitronix has incorporated laser technologies to achieve new metrology capabilities based on the implementation of previously unapplied physical principles. The Xitronix platforms fully support industry automation requirements and meet SEMI standards.
Product overview
Precise, non-destructive characterization of active dopant profile in Ultra-Shallow Junctions
Precise, non-destructive measurement of strain in ultra-thin strained Si layers
Mapping of incoming strained substrate uniformity
Measure strained Si through Hi-K gate dielectrics (channel mobility)
Process control for dopant activation in strained Si
