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Xitronix' Polarization Modulation Photo-Reflectance ("PMPR") systems are designed to provide precision control for strained silicon, dopant activation and gate channel mobility processes for advanced 45 nm process technologies and beyond. Xitronix has incorporated laser technologies to achieve new metrology capabilities based on the implementation of previously unapplied physical principles. The Xitronix platforms fully support SECS protocols and industry automation requirements.
Product overview
- Precise, non-destructive measurement of strain in ultra-thin strained Si layers
- Precise, non-destructive characterization of active dopant profile in Ultra-Shallow Junctions
- Mapping of incoming strained substrate uniformity, including s-SOI
- Measure strained Si through Hi-K gate dielectrics (channel mobility)
- Process control for dopant activation in strained Si
- Greater than 100X improvement in dose sensitivity over existing equipment
- 1 μm spot size (micro-spot)
XP450
By incorporating Xitronix' proprietary photo-reflectance technology for rapid and precise measurement of strained silicon onto existing 200mm metrology platforms, Xitronix provides rapid feedback capability for manufacturers doing their 45 nm process development on 200mm substrates. New metrology capabilities include process control for strained silicon, SOI, SiGe, and active dopant. Xitronix provides complete service plans for the 200mm system.
XP700
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The XP700 300mm system provides breakthrough process control capability essential to the volume manufacture of 45 nm processes. Features include a spectroscopic probe laser beam and a GUI which allows users to define recipes for R&D and SPC of strained Si, dopant activation and gate channel mobility processes. Flexibility is maximized to ensure robust process control capability on virtually any active Si structure. Xitronix' 300mm platform provides the unique advantage of being directly sensitive to electronic properties of Si nanostructures, while meeting all the process control criteria of a fully automated manufacturing environment. Competing technologies such as Raman spectroscopy and XRD cannot provide this capability. Xitronix' PMPR technology is the solution for the 45 nm process node and beyond. |
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