Fab Tool The XP700 300mm system provides breakthrough process control capability essential to the volume manufacture of 45 nm processes. Features include a GUI which allows users to define recipes for R&D and statistical process control ("SPC") of dopant activation and strained silicon processes. Flexibility is maximized to ensure robust process control capability on virtually any active Si structure. Xitronix' 300mm platform provides the unique advantage of being directly sensitive to electronic properties of Si nanostructures, while meeting all the process control criteria of a fully automated manufacturing environment. Competing technologies such as Raman spectroscopy and XRD cannot provide this capability. Xitronix' PMPR technology is the solution for the 45 nm process node and beyond.
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